After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...

Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes. New impedance ...

Wilmington, Delaware, United States, Oct. 30, 2023 (GLOBE NEWSWIRE) -- Transparency Market Research Inc. - The RF plasma generator market was valued at US$ 991 million in 2020. The market is projected ...

(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...

Austin, Sept. 24, 2025 (GLOBE NEWSWIRE) -- RF Plasma Generator Market Size & Growth Insights: According to the SNS Insider,“The RF Plasma Generator Market size was valued at USD 1.96 Billion in 2024 ...

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

After years in R&D, several fab tool vendors last year finally began to ship systems based a next-generation technology called atomic layer etch (ALE). ALE is is moving into 16/14nm, but it will play ...

A review of Ion Beam technology is presented in this paper. The key applications and benefits of using ion beam technology for etching processes in comparison to technology such as plasma etching will ...