After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...

Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif., ...

Plasma Etch Inc. has released its fully automated plasma cleaner, the PE-25-jw. The unit, priced at $6,900, is equipped with a programmable logic controller and a single gas channel, with an option of ...

It has an incredibly low starting price of $6900 USD. Equipped with PLC control, the system comes with a single gas channel, and has the option of a second. It is fully automated. The system is the ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

It's a mistake to assume wafer clamp rings have to polyimide. Several other work about as well. Silicon wafers aren't the only things that lose material in the various etching steps of IC ...

To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...

AUSTIN, Texas — Tokyo Electron Ltd. (TEL) has improved the design of the SCCM (Super Capacitively Coupled Module) plasma etch chamber, the company claimed Monday (Dec. 13). The focus ring and ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...

Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...