After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

Plasma Etch Inc. has released its fully automated plasma cleaner, the PE-25-jw. The unit, priced at $6,900, is equipped with a programmable logic controller and a single gas channel, with an option of ...

It's a mistake to assume wafer clamp rings have to polyimide. Several other work about as well. Silicon wafers aren't the only things that lose material in the various etching steps of IC ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

It has an incredibly low starting price of $6900 USD. Equipped with PLC control, the system comes with a single gas channel, and has the option of a second. It is fully automated. The system is the ...

AUSTIN, Texas — Tokyo Electron Ltd. (TEL) has improved the design of the SCCM (Super Capacitively Coupled Module) plasma etch chamber, the company claimed Monday (Dec. 13). The focus ring and ...

Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes. New impedance ...

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...

A review of Ion Beam technology is presented in this paper. The key applications and benefits of using ion beam technology for etching processes in comparison to technology such as plasma etching will ...

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...

(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...